| Autor: |
M.L. Roush, T.D. Andreadis, O.F. Goktepe, F. Davarya |
| Rok vydání: |
1982 |
| Předmět: |
|
| Zdroj: |
Applications of Surface Science. :235-242 |
| ISSN: |
0378-5963 |
| DOI: |
10.1016/0378-5963(82)90071-x |
| Popis: |
A Monte Carlo based computer code, called EVOLVE, is used to simulate the concentration changes which develop as a consequence of the incident beam atoms and the resulting cascades of recoil atoms. During the bombardment, atomic mixing of all species including the implanted beam atoms is simulated. Simulations are utilized to examine several hypotheses of plausible causes of observed dose-dependent sputtering yields. Another dynamic system examined is that of binary alloys which display preferential sputtering under ion bombardment. The altered composition near the surface of such solids is explored by examining depth profiles under selected special conditions. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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