A deep learning toolset to mask analysis with SEM digital twins

Autor:	Ajay K. Baranwal, Suhas Pillai, Thang Nguyen, Jun Yashima, Jim Dewitt, Noriaki Nakayamada, Mikael Wahlsten, Aki Fujimura
Rok vydání:	2021
Předmět:	Engineering drawing Computer science business.industry Deep learning Artificial intelligence business
Zdroj:	Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::ce5eada4edd2398f4834de7c3b01b9cc https://doi.org/10.1117/12.2601856 Zobrazit plný text záznamu