Impact of pupil plane filtering on mask roughness transfer
| Autor: | Chris Maloney, Burak Baylav, Zac Levinson, Bruce W. Smith, Alessandro Vaglio Pret, Joost Bekaert |
|---|---|
| Rok vydání: | 2013 |
| Předmět: |
Materials science
Orientation (computer vision) business.industry Process Chemistry and Technology Surface finish Filter (signal processing) Edge (geometry) Surfaces Coatings and Films Electronic Optical and Magnetic Materials law.invention Optics Resist law Materials Chemistry Electrical and Electronic Engineering Photolithography business Instrumentation Lithography Aerial image |
| Zdroj: | Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 31:06F801 |
| ISSN: | 2166-2754 2166-2746 |
| Popis: | Line edge roughness (LER) is a common problem to all lithography techniques and is seen as an increasingly important challenge for advanced technology nodes. Contributions to LER can come from the aerial image itself or the resist related processes. Mask roughness belongs to the former group, which can contribute to the low frequency roughness. This paper investigates the mitigating effect of pupil plane filtering on the mask roughness transfer. Experiments were performed using a mask with edge roughness programmed at different periods on 128 nm pitch vertical line/space patterns. A target phase filter was optimized for ArF illumination source and the roughness period of 200 nm. The filter introduces an orientation dependent defocus; hence, reducing the image fidelity in the direction of roughness features without significantly impacting the fidelity of vertical line and space features. Experimental results showed significant reduction in mask roughness transfer for the target roughness period. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|