Partial decarboxylation of hafnium oxide clusters for high resolution lithographic applications

Autor:	Pin-Chia Liao, Po-Hsiung Chen, Yu-Fang Tseng, Ting-An Shih, Ting-An Lin, Tsi-Sheng Gau, Burn-Jeng Lin, Po-Wen Chiu, Jui-Hsiung Liu
Rok vydání:	2022
Předmět:	Materials Chemistry General Chemistry
Zdroj:	Journal of Materials Chemistry C. 10:15647-15655
ISSN:	2050-7534 2050-7526
DOI:	10.1039/d2tc02912j
Popis:	Treatment of hafnium clusters Hf6O4(OH)4(RCO2)12 with LiOH in DCM/H2O afforded Hf6O4(OH)6(RCO2)10, using which high resolution EUV lithographic patterns can be achieved.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::ce3b74bfd1c169ca15a07f8687b2d361 https://doi.org/10.1039/d2tc02912j Zobrazit plný text záznamu