Autor:	Akira Yokota, Shirushi Yamamoto, Wataru Kanai, Hisashi Nakane
Rok vydání:	1983
Předmět:	Materials science Polymers and Plastics business.industry High resolution Nanotechnology General Chemistry Photoresist law.invention Optics Resist law Materials Chemistry Photolithography business Lithography
Zdroj:	Polymer Engineering and Science. 23:1050-1053
ISSN:	1548-2634 0032-3888
DOI:	10.1002/pen.760231815
Popis:	A new negative working photo resist for UV lithography has been produced based on poly(methylisopropenylketone). Its significant characteristic is a minimal swelling upon development, with resulting high resolution capability.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::ce397a0cd229142ed6cf2556a9c87556 https://doi.org/10.1002/pen.760231815 Zobrazit plný text záznamu Plný text