Adhesion and Cohesion Analysis of ArF/SOR Resist Patterns with Microtip of Atomic Force Microscope(AFM)

Autor:	Akira Kawai, Norio Moriike
Rok vydání:	2001
Předmět:	Materials science Polymers and Plastics business.industry Atomic force microscopy Organic Chemistry Modulus Young's modulus Substrate (electronics) Adhesion Synchrotron law.invention symbols.namesake Optics Resist Spring (device) law Materials Chemistry symbols business
Zdroj:	Journal of Photopolymer Science and Technology. 14:507-512
ISSN:	1349-6336 0914-9244
DOI:	10.2494/photopolymer.14.507
Popis:	By directly applying load to a top corner of dot resist pattern with a microcantilever tip, a dot pattern adhering on a substrate can be deformed and collapsed easily. The elastic and adhesion properties of a dot resist pattern can be analyzed quantitatively. The SOR (synchrotron orbital radiation) resist patterns ranging from 84 to 364nm diameter and the ArF resist pattern ranging from 141 to 405nm diameter are used for the investigation. In combination with an analysis of the double spring model, Young's modulus of the SOR resist pattern can be determined to be 1.2GPa. The applying load required for pattern collapse decreases with decreasing the pattern diameter, and it is proportional to the cross-sectional area of the resist pattern. This technique gives useful information to the field of structural designing of resist material.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::ce25dd1508add86e7bc62d1e6af30e32 https://doi.org/10.2494/photopolymer.14.507 Zobrazit plný text záznamu