Autor:	Etsuro Ota, Yoshimasa Ohki, Masako Yudasaka, Rie Kikuchi, Susumu Yoshimura, T. Matsui
Rok vydání:	1994
Předmět:	Materials science Hybrid physical-chemical vapor deposition Chemical engineering Plasma-enhanced chemical vapor deposition Inorganic chemistry Ion plating Deposition (phase transition) Thin film Combustion chemical vapor deposition Electron beam physical vapor deposition Pulsed laser deposition
Zdroj:	International Conference on Science and Technology of Synthetic Metals.
DOI:	10.1109/stsm.1994.835884
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::ce08bda3c554d01062fbdd6ebb4f3dc7 https://doi.org/10.1109/stsm.1994.835884 Zobrazit plný text záznamu