Inelastic Relaxation in Tin Dioxide Thin Films

Autor:	V. I. Mitrokhin, E.S. Rembeza, A. A. Rudenko, S. I. Rembeza
Rok vydání:	2006
Předmět:	Yield (engineering) Materials science Tin dioxide Metallurgy chemistry.chemical_element Condensed Matter Physics Atomic and Molecular Physics and Optics Grain size chemistry.chemical_compound Carbon film chemistry Sputtering General Materials Science Grain boundary Composite material Thin film Tin
Zdroj:	Solid State Phenomena. 115:275-278
ISSN:	1662-9779
DOI:	10.4028/www.scientific.net/ssp.115.275
Popis:	Internal friction results obtained in thin SnO2 films produced by reactive magnetron sputtering (thickness of the film ~ 1 μm) and by the dehydration of water solution of tin salts (thickness of the film ~ 10 μm) are reported. It is suggested that internal friction peak observed in SnO2 films at around 170 oC is caused by relaxation processes on grain boundaries (average grain size is 20 nm). The investigation of internal friction in SnO2 films can yield new information about the structure of thin films.
Databáze:	OpenAIRE
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