Autor: |
Pavel Fellner, M. Makyta, K. Matiašovský |
Rok vydání: |
1984 |
Předmět: |
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Zdroj: |
Electrochimica Acta. 29:1653-1657 |
ISSN: |
0013-4686 |
DOI: |
10.1016/0013-4686(84)89006-4 |
Popis: |
The mechanism of the cathode process in the electrolytic deposition of boron on a platinum electrode has been investigated in the systems LiFKFKBF 4 and LiFKFB 2 O 3 by means of the voltametric and chronopotentiometric methods. It was found that in the system LiFKFKBF 4 boron is reduced directly from the tetrafluoroborate complex anion by a simple 3-electron process. In the system LiFKFB 2 O 3 boron oxide reacts with the basic fluoride electrolyte under formation of the BF − 4 anion and of unspecified oxofluoro complex(es) with a mean oxygen to boron ratio of 1.66. The ratio of boron concentrations in the BF − 4 anion and in the oxofluoro complex(es) is about 0.1. The difference between the deposition potential of boron from those two electrochemically active species is about 0.47 V in favour of BF − 4 . The value of the diffusion coefficient of the BF − 4 anion was found to be 4.4 × 10 −9 m 2 s −1 (700°C). |
Databáze: |
OpenAIRE |
Externí odkaz: |
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