Novel Ion Implantation Process with High Heat Resistant Photoresist in Silicon Carbide Device Fabrication
Autor: | Mina Ryo, Takanori Fujiwara, Naoyuki Oose, Hajime Okumura, Yugo Tanigaki, Kazuhiro Tonari, Tomohiro Imai, Kenji Fukuda, Makoto Utsumi, Masaaki Miyajima, Takao Sakai, Akihiro Otsuki, Yukihiro Furukawa, Shinichi Nakamata, Masahide Gotoh, Yoshiyuki Sakai, Hiroshi Kumura |
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Rok vydání: | 2014 |
Předmět: | |
Zdroj: | Journal of Photopolymer Science and Technology. 27:233-236 |
ISSN: | 1349-6336 0914-9244 |
DOI: | 10.2494/photopolymer.27.233 |
Databáze: | OpenAIRE |
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