Is Your Layout-Density Verification Exact?—A Fast Exact Deep Submicrometer Density Calculation Algorithm
| Autor: | Martin D. F. Wong, Hua Xiang, Ruchir Puri, Kai-Yuan Chao |
|---|---|
| Rok vydání: | 2008 |
| Předmět: |
Engineering
business.industry Calculation algorithm Approximation algorithm Computer Graphics and Computer-Aided Design Integrated circuit layout Design for manufacturability Exact algorithm Feature (computer vision) Electronic engineering Algorithm design Electrical and Electronic Engineering Predictability business Algorithm Software |
| Zdroj: | IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems. 27:621-632 |
| ISSN: | 0278-0070 |
| DOI: | 10.1109/tcad.2008.917962 |
| Popis: | As the device shapes keep shrinking, the designs are more sensitive to manufacturing processes. In order to improve performance predictability and yield, mask-layout uniformity/evenness is highly desired, and it is usually measured by the feature densities within defined feasible ranges determined by the manufacturing-process design rules. To address the density-control problem, one fundamental problem is how to calculate density accurately and efficiently. In this paper, we propose a fast exact algorithm to identify the maximum/minimum density for a given layout. Compared with the existing exact algorithms, our algorithm reduces the running time from days/long hours to a few minutes/seconds. Moreover, it is even faster than the existing approximate algorithms in the literature. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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