Hydrogen incorporation in CNx films deposited by ECR chemical vapor deposition
| Autor: | Raúl Gago, J. M. Albella, M Camero, Cristina Gómez-Aleixandre |
|---|---|
| Rok vydání: | 2003 |
| Předmět: |
Argon
Hydrogen Mechanical Engineering Inorganic chemistry chemistry.chemical_element General Chemistry Chemical vapor deposition Methane Electronic Optical and Magnetic Materials Amorphous solid Elastic recoil detection chemistry.chemical_compound chemistry Plasma-enhanced chemical vapor deposition Materials Chemistry Electrical and Electronic Engineering Chemical composition |
| Zdroj: | Diamond and Related Materials. 12:632-635 |
| ISSN: | 0925-9635 |
| DOI: | 10.1016/s0925-9635(02)00400-4 |
| Popis: | Amorphous CN x H y films have been deposited by electron cyclotron resonance-CVD from argon, nitrogen and methane gas mixtures. The composition and bonding environment of the films, consisting in polymeric chains with amine groups, have been studied by elastic recoil detection analysis (ERDA) and infrared spectroscopy. By proper selection of the gas mixture composition, the way how hydrogen atoms are incorporated in the films can be controlled. Thus, for low methane concentrations [CH 4 /(N 2 + CH 4 ) |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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