Effect of post annealing on properties of N-doped TiO2 films deposited by reactive magnetron sputtering

Autor:	Oleg Kuzmin, K. E. Evdokimov, M. E. Konishchev, Zhilei Sun, Vladimir F. Pichugin
Rok vydání:	2019
Předmět:	Post annealing History Reactive magnetron Materials science Chemical engineering Sputtering Doping Computer Science Applications Education
Zdroj:	Journal of Physics: Conference Series. 1281:012083
ISSN:	1742-6596 1742-6588
Popis:	The paper studies the effect of annealing on the structure and properties of N-doped TiO2 films, deposited by reactive magnetron sputtering. An increase in the annealing temperature results in a reduction of the film thickness and a rise of the refractive index. The post annealing induces the anatase-rutile phase transition and also leads to band gap narrowing and wettability transition.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::cc7a4801cd4b9d017fd755756dc70bf3 https://doi.org/10.1088/1742-6596/1281/1/012083 Zobrazit plný text záznamu