Deep-UV lithographic response and quantum efficiency calculations of poly((trimethylsilyl)methyl Methacrylate-(chloromethyl)styrene) copolymers

Autor:	M. J. Jurek, Elsa Reichmanis, A. E. Novembre, I. P. Heyward, R. Gooden
Rok vydání:	1989
Předmět:	Materials science Trimethylsilyl General Chemical Engineering General Chemistry Photochemistry Styrene chemistry.chemical_compound chemistry Polymer chemistry Materials Chemistry Copolymer Quantum efficiency Methyl methacrylate Lithography
Zdroj:	Chemistry of Materials. 1:509-514
ISSN:	1520-5002 0897-4756
DOI:	10.1021/cm00005a009
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::cc6928313a1d6e5ee48d97f1b2b621f6 https://doi.org/10.1021/cm00005a009 Zobrazit plný text záznamu