| Popis: |
Multicomponent thin films (binary-SiC and ternary-SiCAl) as well as single thin films (silicon Si) were deposited using Thermionic Vacuum Arc (TVA) technology. The thin films were characterized using X-ray diffractometer (XRD, Philips PW1050, Cu K), scanning electron microscope (SEM, Zeiss EVO 50 SEM) accompanied with energy dispersive spectrometer and transmission electron microscope (TEM, Phillips CM 120 ST, 100 kV). The film is composed of nanoparticles very smoothly distributed of 15-30 nanometer size embedded in amorphous matrix film. The results reveal high hardness for SiC (10-40 GPa) and for SiCAl: low wear rate (6.16E-05 mm3/Nm). |
