| Popis: |
Multilayer reflectors are necessary for spectroscopic and imaging systems, working with soft X-rays ((lambda) equals 1..20 nm), for instance for X-ray lithography, microscopy and holography. We have tested a simple method for deposition of multilayer X-ray reflectors by dc-plasmatron sputtering. W-Si multilayers with up to 80 layer pairs, prepared by this method, were characterized by X-ray reflection, AES, RBS, SNMS and AFM. Optical constants, individual layer thicknesses (1..3 nm) and interface roughness were determined by fit of the X-ray reflection curves. |
