Fabrication and investigation of thin-film CdSxSe1–xwaveguides

Autor:	A S Semenov, P V Shapkin, Z É Buachidze, V N Morozov, V A Pletnev, I V Vasilishcheva
Rok vydání:	1982
Předmět:	Materials science Fabrication business.industry General Engineering Refractive index profile law.invention Optics law Etching (microfabrication) Optoelectronics Diffusion (business) Thin film business Diffraction grating Waveguide
Zdroj:	Soviet Journal of Quantum Electronics. 12:1514-1516
ISSN:	0049-1748
DOI:	10.1070/qe1982v012n11abeh006179
Popis:	The diffusion method was used to fabricate CdSxSe1–x solid-solution waveguides with losses in the range 9–13 dB/cm. The refractive index profile of these waveguides was determined. Photochemical etching of the waveguide surface was employed to form diffraction gratings with 103 lines/mm and a relief 40-nm deep.
Databáze:	OpenAIRE
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