Real-time curling probe monitoring of dielectric layer deposited on plasma chamber wall
| Autor: | Hideo Sugai, Keiji Nakamura, Daisuke Ogawa, Masaya Hotta |
|---|---|
| Rok vydání: | 2018 |
| Předmět: |
010302 applied physics
Materials science Physics and Astronomy (miscellaneous) General Engineering Finite-difference time-domain method Analytical chemistry General Physics and Astronomy 02 engineering and technology 021001 nanoscience & nanotechnology 01 natural sciences Curling chemistry.chemical_compound Amorphous carbon Acetylene chemistry Ellipsometry Dielectric layer 0103 physical sciences Inductively coupled plasma 0210 nano-technology Plasma processing |
| Zdroj: | Japanese Journal of Applied Physics. 57:046201 |
| ISSN: | 1347-4065 0021-4922 |
| DOI: | 10.7567/jjap.57.046201 |
| Popis: | A microwave resonator probe called a curling probe (CP) was applied to in situ monitoring of a dielectric layer deposited on a chamber wall during plasma processing. The resonance frequency of the CP was analytically found to shift in proportion to the dielectric layer thickness; the proportionality constant was determined from a comparison with the finite-difference time-domain (FDTD) simulation result. Amorphous carbon layers deposited in acetylene inductively coupled plasma (ICP) discharge were monitored using the CP. The measured resonance frequency shift dictated the carbon layer thickness, which agreed with the results from the surface profiler and ellipsometry. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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