Study on TiO2 thin films grown by advanced pulsed laser deposition on ITO
| Autor: | Cornelia Sima, Constantin Grigoriu |
|---|---|
| Rok vydání: | 2009 |
| Předmět: |
Anatase
Materials science business.industry Annealing (metallurgy) Metals and Alloys chemistry.chemical_element Surfaces and Interfaces Laser Surfaces Coatings and Films Electronic Optical and Magnetic Materials Indium tin oxide Pulsed laser deposition law.invention chemistry.chemical_compound Optics chemistry law Titanium dioxide Materials Chemistry Optoelectronics Thin film business Titanium |
| Zdroj: | Thin Solid Films. 518:1314-1317 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/j.tsf.2009.05.049 |
| Popis: | TiO 2 films were grown by an advanced pulsed laser deposition method (PLD) on ITO substrates to be used as functional electrodes in the manufacturing of solar cells. A pure titanium target (99.99%) was irradiated by a Nd:YAG laser (355 and 532 nm, 5 ns, 35 mJ, 3 J/cm 2 ) in an oxygen atmosphere at different pressures (20–160 mTorr) and at room temperature. After deposition, the films were subjected to an annealing process at 350 °C. The film structure, surface morphology, thickness, roughness, and optical transmission were investigated. Regardless of the wavelength used, the films deposited at room temperature presented only Ti 2 O and TiO peaks. After thermal treatment, the TiO 2 films became strongly crystalline, with a tetragonal structure and in the anatase phase; the threshold temperature value was 250 °C. The deposition rate was in the range of 0.035–0.250 nm/pulse, and the roughness was 135–305 nm. Optical transmission of the films in the visible range was between 40% and 60%. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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