Influence of Material Properties of PECVD Silicon Nitride Films Prepared at 150℃ from Highly Diluted SiH4 in N2

Autor:	Wan-Shick Hong, Kil-Sun No, Di-Su Keum
Rok vydání:	2013
Předmět:	Modeling and Simulation Metals and Alloys Surfaces Coatings and Films Electronic Optical and Magnetic Materials
Zdroj:	Korean Journal of Metals and Materials. 51:233-238
ISSN:	2288-8241 1738-8228
DOI:	10.3365/kjmm.2013.51.3.233
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::cafc9348024c0af941e38ef91a026536 https://doi.org/10.3365/kjmm.2013.51.3.233 Zobrazit plný text záznamu