Elucidating the Reaction Mechanism of Atomic Layer Deposition of Al2O3 with a Series of Al(CH3)xCl3–x and Al(CyH2y+1)3 Precursors
| Autor: | Il-Kwon Oh, Tania E. Sandoval, Tzu-Ling Liu, Nathaniel E. Richey, Chi Thang Nguyen, Bonwook Gu, Han-Bo-Ram Lee, Ralf Tonner-Zech, Stacey F. Bent |
|---|---|
| Rok vydání: | 2022 |
| Předmět: | |
| Zdroj: | Journal of the American Chemical Society. 144:11757-11766 |
| ISSN: | 1520-5126 0002-7863 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|