Elucidating the Reaction Mechanism of Atomic Layer Deposition of Al2O3 with a Series of Al(CH3)xCl3–x and Al(CyH2y+1)3 Precursors

Autor:	Il-Kwon Oh, Tania E. Sandoval, Tzu-Ling Liu, Nathaniel E. Richey, Chi Thang Nguyen, Bonwook Gu, Han-Bo-Ram Lee, Ralf Tonner-Zech, Stacey F. Bent
Rok vydání:	2022
Předmět:	Colloid and Surface Chemistry General Chemistry Biochemistry Catalysis
Zdroj:	Journal of the American Chemical Society. 144:11757-11766
ISSN:	1520-5126 0002-7863
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::caf75b97a14540b23f8f4bebdfeb12c9 https://doi.org/10.1021/jacs.2c03752 Zobrazit plný text záznamu