Tunneling studies of mesoscopic all-NbN junctions

Autor: Orest G. Symko, R. Li, M.D. Reeve
Rok vydání: 1993
Předmět:
Zdroj: IEEE Transactions on Applied Superconductivity. 3:1976-1979
ISSN: 1558-2515
1051-8223
DOI: 10.1109/77.233571
Popis: A scanning tunneling microscope was used to position a NbN tip near a NbN thin film sputtered on a Si substrate. Measurements at 4.2 K clearly show an energy gap of 5.0 mV. The Coulomb blockade of tunneling and the Coulomb staircase, formed by single-electron charging of the central electrode of a double capacitor system consisting of a substrate, a particle lodged in the oxide, and a tip, were observed at a number of points on the film. Experiments were repeated at room temperature. Fitting I-V and dI/dV-V curves to theory yields capacitances on the order of 5*10/sup 19/ to 2*10/sup -18/ F. The granular nature of the sputtered NbN greatly facilitates formation of the requisite double junction structure. >
Databáze: OpenAIRE