Study on the Behaviors of HNO3 in Highly Conductive Antimony Doped Tin Oxide Thin Films Deposited by Novel Mist CVD System
Autor: | T. Hiramatsu, H. Orita, Shizuo Fujita, L. Liu, S. Sato, T. Kawaharamura, G.T. Dang, M. Ueda |
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Rok vydání: | 2018 |
Předmět: | |
Zdroj: | Extended Abstracts of the 2018 International Conference on Solid State Devices and Materials. |
DOI: | 10.7567/ssdm.2018.n-3-03 |
Databáze: | OpenAIRE |
Externí odkaz: |