Study on the Behaviors of HNO3 in Highly Conductive Antimony Doped Tin Oxide Thin Films Deposited by Novel Mist CVD System

Autor: T. Hiramatsu, H. Orita, Shizuo Fujita, L. Liu, S. Sato, T. Kawaharamura, G.T. Dang, M. Ueda
Rok vydání: 2018
Předmět:
Zdroj: Extended Abstracts of the 2018 International Conference on Solid State Devices and Materials.
DOI: 10.7567/ssdm.2018.n-3-03
Databáze: OpenAIRE