Interference Lithography Patterned Nanogratings in LiNbO3 Fabricated by Dry Etching

Autor:	Qiong Chan Gu, Xiao Xiao Jiang, Guangyuan Si, Jiang Tao Lv
Rok vydání:	2014
Předmět:	chemistry.chemical_compound Materials science chemistry Etching (microfabrication) Lithium niobate General Engineering Analytical chemistry Dry etching Plasma Reactive-ion etching Inductively coupled plasma Layer (electronics) Interference lithography
Zdroj:	Advanced Materials Research. :7-10
ISSN:	1662-8985
DOI:	10.4028/www.scientific.net/amr.1049-1050.7
Popis:	Channel waveguides have been fabricated in x-cut lithium niobate (LiNbO3) by proton exchange (PE) method and optically measured. The thickness and the optical constants of the thin PE layer were characterized using a prism coupling technique. The PE area was plasma etched and a 2.775-μm total etching depth was achieved. The measured average etching rate is 92.5 nm/min. One-and two-dimensional dense arrays of LiNbO3 nanostructures have also been fabricated by using interference lithography (IL) and inductively coupled plasma reactive ion etching (ICP-RIE) techniques.Intorduction
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::caba1e8ef6f9bbb44c386dedaded8bd0 https://doi.org/10.4028/www.scientific.net/amr.1049-1050.7 Zobrazit plný text záznamu