Fourier transform infrared reflection absorption spectroscopy and microspectroscopy, a tool to investigate thermally grown oxide scales
| Autor: | Benoit Lefez, J. Lopitaux, B. Hannoyer, Marie-Pierre Bacos, E. Beucher |
|---|---|
| Rok vydání: | 2007 |
| Předmět: |
Anatase
Materials science Absorption spectroscopy Metals and Alloys Analytical chemistry Oxide Infrared spectroscopy Surfaces and Interfaces Fourier transform spectroscopy Surfaces Coatings and Films Electronic Optical and Magnetic Materials Amorphous solid chemistry.chemical_compound chemistry Rutile Materials Chemistry Fourier transform infrared spectroscopy |
| Zdroj: | Thin Solid Films. 516:349-354 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/j.tsf.2007.06.126 |
| Popis: | The main goal of this work is to show the interesting contribution of reflectance infrared spectroscopy to determine the composition of oxide films on metal surfaces. Illustration is reported on oxidation of α 2 -TiAl (Ti75-Al25 at.%) and γ-TiAl (Ti50–Al50 at.%) alloys, carried out at 650 °C under laboratory atmosphere. Reflectance infrared spectra were recorded on an FTIR 710 Nicolet spectrophotometer, equipped with a Nicolet IR plan microscope. The knowledge of the infrared optical constants makes it possible to predict the infrared reflection spectra of different thin layers. As there is a lack of data in literature, theoretical calculations have been made in order to study experimental spectra. To illustrate these computations the first band observed for a thin film (200 nm) of Al 2 O 3 is the higher longitudinal optical (LO) mode, the position of which is 920 cm − 1 for α-Al 2 O 3 , 930 cm − 1 for γ-Al 2 O 3 or a broad band at 980 cm − 1 for amorphous Al 2 O 3 . In the case of TiO 2 /alloy system, the LO mode moves from 830 cm − 1 for rutile TiO 2 to 880 cm − 1 for anatase TiO 2 . A peak fit program was applied to the spectra in order to extract each oxide contribution. The position of the fitted single absorption bands makes it possible to identify the different oxides. The oxide grown on α 2 -TiAl phase, consists of α-Al 2 O 3 and rutile TiO 2 (24 h to 500 h of oxidation treatment), γ-Al 2 O 3 and rutile TiO 2 for 1000 h of oxidation treatment. Chemical maps reveal heterogeneous distribution of the oxides in the layer. A detailed surface characterization showed that the surface was principally covered with α-Al 2 O 3 and locally with an Al 2 O 3 /TiO 2 mixture. In the case of γ-TiAl oxidation, the oxide film consists of α-Al 2 O 3 , γ-Al 2 O 3 and rutile TiO 2 mixture. FTIR spectroscopy provides important information about amorphous, poor or well crystallized materials when X-ray diffraction is only convenient for crystallized phases. |
| Databáze: | OpenAIRE |
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