Photoetching of Thin Lead Films with Nitromethane

Autor:	L. H. Kaplan
Rok vydání:	1964
Předmět:	chemistry.chemical_compound Lead (geology) Nitromethane Chemistry General Engineering Physical and Theoretical Chemistry Photochemistry
Zdroj:	The Journal of Physical Chemistry. 68:94-100
ISSN:	1541-5740 0022-3654
DOI:	10.1021/j100783a015
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::c9db9bd85b2d0576fe7620ed472eb52f https://doi.org/10.1021/j100783a015 Zobrazit plný text záznamu