Effect of deposition conditions and buffer layers on amorphous or polytype phase formation in Al2O3 thin films by chemical vapor deposition using tri-methyl aluminum
| Autor: | Tadashi Shiota, Kazuo Shinozaki, Takashi Tanaka, Osamu Sakurai, Naoki Wakiya, Kouichi Yasuda, Chunfu Lin, A. Nishiyama |
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| Rok vydání: | 2019 |
| Předmět: |
Materials science
chemistry.chemical_element General Chemistry Chemical vapor deposition Condensed Matter Physics Epitaxy Buffer (optical fiber) Phase formation Amorphous solid chemistry Chemical engineering Aluminium Materials Chemistry Ceramics and Composites Deposition (phase transition) Thin film |
| Zdroj: | Journal of the Ceramic Society of Japan. 127:443-450 |
| ISSN: | 1348-6535 1882-0743 |
| DOI: | 10.2109/jcersj2.18192 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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