High-Sensitivity and High-Resolution Contact Hole Patterning by Enhanced-Wettability Developer

Autor:	Shigeki Shimomura, Hisayuki Shimada, Tadahiro Ohmi, Kouichi Hirose
Rok vydání:	1993
Předmět:	Materials science business.industry General Engineering General Physics and Astronomy Nanotechnology Photoresist Chloride chemistry.chemical_compound Pulmonary surfactant chemistry Resist medicine Optoelectronics Ammonium chloride Wetting Stepper business Dissolution medicine.drug
Zdroj:	Japanese Journal of Applied Physics. 32:347
ISSN:	1347-4065 0021-4922
DOI:	10.1143/jjap.32.347
Popis:	We have determined that high-sensitivity and high-resolution contact hole photoresist patterning can be achieved using an optimized combination of developer, added surfactant and ammonium chloride salt. The addition of surfactant improves the wettability of the developer to promote resist dissolution. The presence of ammonium chloride salt protects the sidewall of the contact hole resist pattern to achieve good pattern profile. The optimal developer can form contact hole patterns smaller than the illumination wavelength of the stepper without the use of phase shifting technology.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::c8facfa69295c28d6f877679826506ca https://doi.org/10.1143/jjap.32.347 Zobrazit plný text záznamu