Secondary ion mass spectrometry depth profiling of 59Co implanted into nickel

Autor:	S Gautrot, M. Vayer, O. Kaïtasov, S Houdayer, C Tessier, Laetitia Vincent, J. Chaumont, Thierry Sauvage
Rok vydání:	2003
Předmět:	Nuclear and High Energy Physics Chemistry Analytical chemistry chemistry.chemical_element Oxygen Ion Secondary ion mass spectrometry Nickel Low energy Sputtering Surface roughness Atomic physics Instrumentation Cobalt
Zdroj:	Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 207:339-344
ISSN:	0168-583X
DOI:	10.1016/s0168-583x(03)00837-1
Popis:	Implantations of 59Co ions into nickel films at energies between 150 and 1000 keV have been performed. Cobalt depth profiles are measured by secondary ion mass spectrometry. The influence of oxygen flooding on the development of surface roughness has been studied in detail. Under the chosen measuring conditions, the mean sputtering rate is constant. Values of the most probable projected range have been extracted from the measured depth profiles and compared with SRIM calculations yielding a close agreement for the highest energies. However, it is found that SRIM underestimates the stopping power at low energy (E
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::c8a2282b6a1b00ef1f1937012244da73 https://doi.org/10.1016/s0168-583x(03)00837-1 Zobrazit plný text záznamu Full Text from ScienceDirect