Particle Measurements during Sputtering Processes using a Small Mass Analyzer

Autor:	Tatsuya Banno, Shinichiro Michizono, Yoshio Saitoh
Rok vydání:	1997
Předmět:	Spectrum analyzer Analytical chemistry chemistry.chemical_element Plasma Partial pressure Condensed Matter Physics Nitrogen Surfaces Coatings and Films Ion chemistry Sputtering Particle Electrical and Electronic Engineering Tin
Zdroj:	SHINKU. 40:671-674
ISSN:	1880-9413 0559-8516
DOI:	10.3131/jvsj.40.671
Popis:	A newly developed small mass analyzer (MPA : Micropole Analyzer) was installed to a TiN sputtering process chamber without differential pumping units. It is demonstrated that mass analysis is performed at a pressure as high as 0.5 Pa of Ar+N2 and even in the presence of rf-discharge. Results of the measurements of ion species coming out of the plasma to the MPA and of the partial pressure of nitrogen are described and discussed.
Databáze:	OpenAIRE
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