Structural properties of ZnO:Al films produced by the sol–gel technique
Autor: | R. L. Juskenas, V. V. Sidsky, E. P. Zaretskaya, V. F. Gremenok, A. V. Semchenko |
---|---|
Rok vydání: | 2015 |
Předmět: |
Diffraction
Materials science business.industry Surface finish Condensed Matter Physics Atomic and Molecular Physics and Optics Electronic Optical and Magnetic Materials symbols.namesake Optics Chemical engineering Microscopy X-ray crystallography Surface roughness symbols business Raman spectroscopy Deposition (law) Sol-gel |
Zdroj: | Semiconductors. 49:1253-1258 |
ISSN: | 1090-6479 1063-7826 |
Popis: | ZnO:Al films are produced by sol–gel deposition at temperatures of 350–550°C, using different types of reagents. Atomic-force microscopy, X-ray diffraction analysis, Raman spectroscopy, and optical transmittance measurements are used to study the dependence of the structural, morphological, and optical properties of the ZnO:Al coatings on the conditions of deposition. The optical conditions for the production of ZnO:Al layers with preferred orientation in the [001] direction and distinguished by small surface roughness are established. The layers produced in the study possess optical transmittance at a level of up to 95% in a wide spectral range and can be used in optoelectronic devices. |
Databáze: | OpenAIRE |
Externí odkaz: |