Effect of deposition conditions on the properties of thin permalloy film
| Autor: | J. D. Freeman |
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| Rok vydání: | 1991 |
| Předmět: | |
| Zdroj: | Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 9:421-425 |
| ISSN: | 1520-8559 0734-2101 |
| DOI: | 10.1116/1.577425 |
| Popis: | The saturation magnetostriction λs of thin Permalloy films, used in magnetoresistive reproduce heads, has to be strictly controlled to be negative and less than 3×10−7. The value of λs for NiFe is a strong function of film composition. [E. Klokholm and J. A. Aboaf, J. Appl. Phys. 52, 2474, (1981).] [R. M. Borzorth and J. G. Walker, Phys. Rev. 89, 624 (1951).] Since the composition of the target material could be controlled to only ±0.2% of Ni, the potential changes in λs could have been as large as 6×10−7, which exceeded the material specification. Therefore, the effect of substrate bias (0 to −60 V), sputtering pressure (2 to 20 mTorr), and target voltage (200 to 1000 V) on magnetostriction has been investigated to identify the best process control parameter. Sputtering has been performed in an argon atmosphere using a triode source. The target was vacuum cast NiFe. Thermal oxide‐coated Si wafers were used as a substrate. It was found that the substrate bias has a strong effect on λs; however, the thickn... |
| Databáze: | OpenAIRE |
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