Removal of Novolac Photoresist with Various Concentrations of Photo-active Compound Using H2/O2 Mixtures Activated on a Tungsten Hot-wire Catalyst

Autor:	Masashi Yamamoto, Shota Sogo, Koki Akita, Hideo Horibe, Ryusei Sogame, Shiro Nagaoka, Hironobu Umemoto
Rok vydání:	2021
Předmět:	Materials science Polymers and Plastics Chemical engineering chemistry Active compound Organic Chemistry Materials Chemistry chemistry.chemical_element Photoresist Tungsten Catalysis
Zdroj:	Journal of Photopolymer Science and Technology. 34:499-504
ISSN:	1349-6336 0914-9244
DOI:	10.2494/photopolymer.34.499
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::c83874cb95a8dc2270445e8c288c3357 https://doi.org/10.2494/photopolymer.34.499 Zobrazit plný text záznamu