Highly oriented NiFe soft magnetic films on Si substrates

Autor:	Heng Gong, Maithri Rao, David N. Lambeth, David E. Laughlin
Rok vydání:	1999
Předmět:	Diffraction Crystallography Materials science Ferromagnetism Transmission electron microscopy X-ray crystallography General Physics and Astronomy Magnetic films Sputter deposition Thin film Epitaxy
Zdroj:	Journal of Applied Physics. 85:5750-5752
ISSN:	1089-7550 0021-8979
DOI:	10.1063/1.370114
Popis:	Highly oriented NiFe thin films have been produced via sputter deposition on HF etched Si substrates. Cu and Ag are used as underlayers to induce the epitaxial growth of NiFe films. The orientation relationships between NiFe, Cu, Ag, and Si have been determined by x-ray diffraction measurements and transmission electron microscopy. Magnetic properties have also been characterized.
Databáze:	OpenAIRE
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