No‐heating deposition of ferroelectric x %YO 1.5 ‐(100– x %)(Hf 1 −y Zr y )O 2 films

Autor:	Takanori Mimura, Reijiro Shimura, Akinori Tateyama, Yoshiko Nakamura, Takahisa Shiraishi, Hiroshi Funakubo
Rok vydání:	2023
Předmět:	Materials Chemistry Surfaces and Interfaces Electrical and Electronic Engineering Condensed Matter Physics Surfaces Coatings and Films Electronic Optical and Magnetic Materials
Zdroj:	physica status solidi (a).
ISSN:	1862-6319 1862-6300
DOI:	10.1002/pssa.202300100
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::c810c913b6769f7c97b87a78064a80a5 https://doi.org/10.1002/pssa.202300100 Zobrazit plný text záznamu Plný text