Silicon-based, protective transparent multilayer coatings deposited at high rate on optical polymers by dual-mode MW/r.f. PECVD
| Autor: | V.A. Yakovlev, Christian Godet, Bernard Drevillon, F. Coeuret, J. Huc, J. Y. Parey, J.C. Rostaing, R. Etemadi |
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| Rok vydání: | 1993 |
| Předmět: |
Materials science
Metals and Alloys Mineralogy Surfaces and Interfaces Chemical vapor deposition Nitride engineering.material Silane Surfaces Coatings and Films Electronic Optical and Magnetic Materials chemistry.chemical_compound Coating chemistry Plasma-enhanced chemical vapor deposition visual_art Materials Chemistry visual_art.visual_art_medium engineering Polycarbonate Composite material Optical filter Layer (electronics) |
| Zdroj: | Thin Solid Films. 236:58-63 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/0040-6090(93)90642-3 |
| Popis: | Protective transparent coatings have been deposited on polycarbonate and CR 39 by dual mode MW/r.f. plasma-enhanced chemical vapour deposition from silane. The layer sequence consists of appropriate adhesion-promoting pretreatment, an intermediate columnar silica layer and a hard, densified nitride layer with adjusted intrinsic comprensive stress by means of a particular coupling of the MW and r.f. plasmas. The deposition rate was up to 250 nm min−1 for silica. Optical filters fabricated by similar processes can be included in the coating structure. Superior abrasion resistance and thermal variation endurance are obtained without the need for any wet process step. |
| Databáze: | OpenAIRE |
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