Planarization of the porous surface of composition 'nanoporous silicon dioxide - titanium dioxide' by atomic-molecular chemical assembly

Autor:	Victor V. Luchinin, Mikhail F. Panov, Alexandr A. Romanov
Rok vydání:	2016
Předmět:	Atomic layer deposition Materials science Silicon chemistry Chemical engineering Ellipsometry Nanoporous Chemical-mechanical planarization Inorganic chemistry chemistry.chemical_element Porosity Refractive index Titanium
Zdroj:	2016 14th International Baltic Conference on Atomic Layer Deposition (BALD).
DOI:	10.1109/bald.2016.7886522
Popis:	The surface planarization of nanoporous SiO2 is made by method of atomic-molecular layer deposition of TiO2 nanofilm in different modes. A penetration of TiO2 in nano-pores of SiO2 is controlled by ellipsometry.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::c80064e824fa2f6bbe01967b56c39bb6 https://doi.org/10.1109/bald.2016.7886522 Zobrazit plný text záznamu