Analysis of large‐area beam attacks on surfaces and testing of etching reactions
| Autor: | U. Köhler, U. Bänziger, P. Hoffmann, H.‐C. Scheer, G. Neumann, B. Schneemann, Ch Huth, J. Janes |
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| Rok vydání: | 1992 |
| Předmět: | |
| Zdroj: | Review of Scientific Instruments. 63:48-55 |
| ISSN: | 1089-7623 0034-6748 |
| Popis: | An apparatus has been constructed to analyze the particle flux of positive ions on surfaces from dry etching reactors. The particle flux can emerge from a great variety of reactive ion etching systems or from reactive ion beam etching sources. The particle beam passes through a small orifice with a diameter of 100 μm. A differentially pumped quadrupole mass spectrometer with a specially designed ion transfer optics performs the energy analysis of positive ions. The energy range can be varied between 0 and 500 eV with a resolution of 1%. The angular distribution measurements of the particle flux are carried out varying the inclination of the mass analyzer by ±20° with the vertex lying centrally in the sampling orifice. The angular resolution is about 1°. Rotation of the source on top of the apparatus and translation over ±10 cm in xy direction and 15 cm in z direction perpendicular to it is provided in order to assure fully local resolution. The electrical properties of the orifice‐ion optics system is dis... |
| Databáze: | OpenAIRE |
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