Review of essential use of fluorochemicals in lithographic patterning and semiconductor processing
| Autor: | Christopher K. Ober, Florian Käfer, Jingyuan Deng |
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| Rok vydání: | 2022 |
| Zdroj: | Journal of Micro/Nanopatterning, Materials, and Metrology. 21 |
| ISSN: | 2708-8340 |
| DOI: | 10.1117/1.jmm.21.1.010901 |
| Databáze: | OpenAIRE |
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