High‐rate, low‐temperature deposition of multifunctional nano‐crystalline silicon nitride films

Autor:	Youn-Jin Lee, Ki-Su Keum, Jae-Dam Hwang, Kyoung Min Lee, Wan-Shick Hong
Rok vydání:	2010
Předmět:	High rate chemistry.chemical_compound Materials science Chemical engineering Silicon nitride chemistry Low temperature deposition Plasma-enhanced chemical vapor deposition Phase (matter) General Materials Science Dielectric Electrical and Electronic Engineering Nano crystalline
Zdroj:	Journal of Information Display. 11:109-112
ISSN:	2158-1606 1598-0316
DOI:	10.1080/15980316.2010.9656255
Popis:	The solid phase compositions and dielectric properties of silicon nitride (SiNx) films prepared using the plasma enhanced chemical vapor deposition (PECVD) technique at a low temperature (200°C) we...
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::c6810471484e64383ec87696aec36755 https://doi.org/10.1080/15980316.2010.9656255 Zobrazit plný text záznamu