| Autor: |
Fa Qin Xie, Shi Da Shen, Zong Chun Hu, Xiang Qing Wu |
| Rok vydání: |
2010 |
| Předmět: |
|
| Zdroj: |
Advanced Materials Research. :1399-1403 |
| ISSN: |
1662-8985 |
| DOI: |
10.4028/www.scientific.net/amr.97-101.1399 |
| Popis: |
In this paper, aluminum films were deposited on the TiAl alloy by multi-arc ion plating (MAIP) and subsequently diffusion-treated under 720°C for 4h. It is revealed by XRD and SEM/EDS that the film consisted of Al turn to an outer Al2O3 layer and inner TiAl3 layer after diffusion treatment. Cyclic oxidation tests show that the surface of the film formed a compact and continuous Al2O3 layer that prevents the TiAl substrate from oxidation, and the oxidation rate of the specimen with Al diffusion film is as low as 1.84 mg/cm2. The MAIP Al film after diffusion treatment is effective in improving the high-temperature oxidation resistance of TiAl alloys. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
|
