Exploitation of atomic layer deposition for nanostructured materials
| Autor: | Kaupo Kukli, Marianna Kemell, Mikko Ritala, Jun Lu, Viljami Pore, Eero Santala, Markku Leskelä |
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| Rok vydání: | 2007 |
| Předmět: |
010302 applied physics
Materials science Bioengineering Nanotechnology 02 engineering and technology Nitride engineering.material 021001 nanoscience & nanotechnology 01 natural sciences Nanomaterials Biomaterials Atomic layer deposition Coating Mechanics of Materials Nanofiber 0103 physical sciences engineering Deposition (phase transition) Nanorod Thin film 0210 nano-technology |
| Zdroj: | Materials Science and Engineering: C. 27:1504-1508 |
| ISSN: | 0928-4931 |
| DOI: | 10.1016/j.msec.2006.06.006 |
| Popis: | In making and modifying nanomaterials conformality is a prerequisite for the thin film deposition method. From its principle ALD is an ideal method for coating nanomaterials. In this paper the use of ALD for making nanostructured materials is exemplified by many ways: making of nanolaminates, deposition of thin films inside nanopores, as well as coating of nanofibers and nanorods. The materials deposited by ALD are mostly oxides, nitrides and metals. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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