Electron Field Emission of CN x Thin Films Prepared by Low Pressure Plasma Enhanced Chemical Vapour Deposition

Autor:	Ye Ming-sheng, Zhang Zhihong, Lu Xian-feng, Guo Huaixi, Li Jin-chai
Rok vydání:	2002
Předmět:	X-ray spectroscopy Field electron emission Surface coating Materials science X-ray photoelectron spectroscopy Analytical chemistry General Physics and Astronomy Chemical vapor deposition Thin film Atomic physics Nuclear Experiment Spectroscopy Electron spectroscopy
Zdroj:	Chinese Physics Letters. 19:416-418
ISSN:	1741-3540 0256-307X
Popis:	CNx thin films were prepared using low pressure plasma enhanced chemical vapour deposition, and then bombarded by low-energy N2+. The compositions before and after N2+ bombardment were compared using x-ray photoelectron spectroscopy. The electron field emission characteristics of CNx thin films before and after N2+ bombardment were studied under the pressure of 10-6 Pa. For the samples, the turn-on emission field decreased from 2.5 V/µm to 1.2 V/µm while the stable current density increased from 0.5 mA/cm2 to a value larger than 1 mA/cm2 before and after the bombardment. Our results illustrate that the field emission characteristics were improved after the bombardment of N+2.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::c57e3e792a83d6dc69299b7d0db69da9 https://doi.org/10.1088/0256-307x/19/3/339 Zobrazit plný text záznamu