Plasma deposition of carbon layer: Correlations between plasma parameters, film structure and properties
| Autor: | B. Bernecker, D. Escaich, Richard Clergereaux, Patrice Raynaud, I. Savin de Larclause |
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| Rok vydání: | 2006 |
| Předmět: |
Chemistry
Plasma parameters Mechanical Engineering Analytical chemistry General Chemistry Plasma Dissociation (chemistry) Electron cyclotron resonance Ion source Electronic Optical and Magnetic Materials Amorphous solid Plasma-enhanced chemical vapor deposition Materials Chemistry Electrical and Electronic Engineering Thin film |
| Zdroj: | Diamond and Related Materials. 15:888-892 |
| ISSN: | 0925-9635 |
| Popis: | The links between plasma parameters, discharge, film structure and properties are not really yet understood for amorphous hydrogenated carbon layers (a-C:H) plasma deposition. Here, a-C:H layers are deposited in a dual radio-frequency–multipolar microwave plasma excited by distributed electron cyclotron resonance reactor at low CH 4 pressure. This study deals with the plasma analysis, the film characterization and with plasma parameters effect on a-C:H films deposition, structure and properties. The discharge analysis shows that CH 4 is decomposed in CH y 1 + H radicals and that C 2 H 2 y 2 are present in the discharge. As at low pressure, recombination can only take place on the surface, C 2 H 2 y 2 desorbs from the surface. Moreover, C 2 species are observed attributed to C 2 H 2 y 2 dissociation. The evolution of film composition with plasma power shows that the proportion of sp 2 CC decreases in contrast with those of CH bonds which increases. From these observations, a phenomenological model for a-C:H deposition can be proposed. Finally, properties are correlated with the film structure and the effect of MW plasma power can then be given. |
| Databáze: | OpenAIRE |
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