Plasma-enhanced chemical vapor deposition of carbon films using dibromoadamantane
| Autor: | Hirotoshi Ishii, Kunihide Tachibana, Yoshiyasu Nishimura, Tatsuru Shirafuji |
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| Rok vydání: | 2009 |
| Předmět: |
chemistry.chemical_classification
Chemistry Adamantane Metals and Alloys Analytical chemistry Surfaces and Interfaces Chemical vapor deposition Surfaces Coatings and Films Electronic Optical and Magnetic Materials chemistry.chemical_compound Carbon film Chemical bond Plasma-enhanced chemical vapor deposition Carbon–carbon bond Materials Chemistry Organic chemistry Thermal stability Thin film |
| Zdroj: | Thin Solid Films. 518:993-1000 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/j.tsf.2009.07.170 |
| Popis: | Carbon thin films are prepared from adamantane and dibromoadamantane by using a plasma-enhanced chemical vapor deposition method. Deposition rate for dibromoadamantane is approximately two times higher than that for pure adamantane. Infrared spectra of the films indicate that adamantane units are incorporated in the films, although higher electron temperature results in disorder in the films. The films prepared from dibromoadamantane have higher thermal stability, higher hardness and Young modulus than those from pure adamantane. Permittivity (= 3–4) of the dibromoadamantane films is higher than that (= 2–3) of pure adamantane films, which is regarded as a result of incorporation of bromine atoms and C=C bonds having higher polarizability according to the structural analysis of the films. Possible solution methods are proposed for reducing inclusion of such unfavorable chemical species and chemical bonds. |
| Databáze: | OpenAIRE |
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