| Autor: |
Cecilia Montgomery, Richard J. Matyi, Charles R. Szmanda, Robert L. Brainard, Elsayed Hassanein, Craig Higgins, Alin Antohe, Kim Dean, Andrew C. Rudack, Dimitra Niakoula, Gregg M. Gallatin, Andy Ma, Patrick P. Naulleau, Emil Piscani, Matt Malloy, Kathleen Spear, Anwar Khurshid, Jim Thackeray, Gregory Denbeaux, Jeff D. Byers, Christopher N. Anderson |
| Rok vydání: |
2008 |
| Předmět: |
|
| Zdroj: |
SPIE Proceedings. |
| ISSN: |
0277-786X |
| Popis: |
Base titration methods are used to determine C-parameters for three industrial EUV photoresist platforms (EUV- 2D, MET-2D, XP5496) and twenty academic EUV photoresist platforms. X-ray reflectometry is used to measure the density of these resists, and leads to the determination of absorbance and film quantum yields (FQY). Ultrahigh levels of PAG show divergent mechanisms for production of photoacids beyond PAG concentrations of 0.35 moles/liter. The FQY of sulfonium PAGs level off, whereas resists prepared with iodonium PAG show FQYs that increase beyond PAG concentrations of 0.35 moles/liter, reaching record highs of 8-13 acids generated/EUV photons absorbed. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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