A model-based approach for the scattering-bar printing avoidance
| Autor: | Yunfei Deng, Liang Li, Jingjing Zhang, Feng Shao, Christian Zuniga, Yaojun Du |
|---|---|
| Rok vydání: | 2018 |
| Předmět: |
Scattering
Computer science Semiconductor device fabrication Bar (music) 02 engineering and technology 021001 nanoscience & nanotechnology 01 natural sciences 010309 optics Process variation 0103 physical sciences Line (geometry) Electronic engineering Wafer Node (circuits) Process window 0210 nano-technology |
| Zdroj: | Optical Microlithography XXXI. |
| DOI: | 10.1117/12.2295451 |
| Popis: | As the technology node for the semiconductor manufacturing approaches advanced nodes, the scattering-bars (SBs) are more crucial than ever to ensure a good on-wafer printability of the line space pattern and hole pattern. The main pattern with small pitches requires a very narrow PV (process variation) band. A delicate SB addition scheme is thus needed to maintain a sufficient PW (process window) for the semi-iso- and iso-patterns. In general, the wider, longer, and closer to main feature SBs will be more effective in enhancing the printability; on the other hand, they are also more likely to be printed on the wafer; resulting in undesired defects transferable to subsequent processes. In this work, we have developed a model based approach for the scattering-bar printing avoidance (SPA). A specially designed optical model was tuned based on a broad range of test patterns which contain a variation of CDs and SB placements showing printing and non-printing scattering bars. A printing threshold is then obtained to check the extra-printings of SBs. The accuracy of this threshold is verified by pre-designed test patterns. The printing threshold associated with our novel SPA model allows us to set up a proper SB rule. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|