Application of Selective Si:C Epitaxy For Recessed Source/Drain Technology
| Autor: | Yihwan Kim, Zhiyuan Ye, Ali Zojaji, Errol Sanchez, Satheesh Kuppurao |
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| Rok vydání: | 2006 |
| Zdroj: | ECS Meeting Abstracts. :1451-1451 |
| ISSN: | 2151-2043 |
| DOI: | 10.1149/ma2006-02/31/1451 |
| Popis: | not Available. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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