Positive tone dry development process for 0.25 .MU.m lithography

Autor:	Kurt G. Ronse, Luc Van den Hove, Ki-Ho Baik, Anne-Marie Goethals
Rok vydání:	1994
Předmět:	Tone (musical instrument) Materials science Polymers and Plastics business.industry Organic Chemistry Materials Chemistry Process (computing) Optoelectronics business Lithography
Zdroj:	Journal of Photopolymer Science and Technology. 7:517-532
ISSN:	1349-6336 0914-9244
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::c4b15469f0c69c805064b135123118ce https://doi.org/10.2494/photopolymer.7.517 Zobrazit plný text záznamu